Plasma Surface Cleaning for GaN and Ga₂O₃ Devices: Enhancing Contact Reliability and Thermal Stability
Plasma cleaning semiconductor surfaces removes native oxides, carbon contamination, and dangling bonds from GaN and Ga₂O₃ at low temperatures, improving ohmic contact resistance and device reliability without the thermal damage that traditional processing causes. Why Surface Preparation Is the Bottleneck Nobody Talks About GaN and Ga₂O₃ get a lot of attention for the right reasons. […]
