| 1. Controlled and Gentle Plasma Output | The 500W plasma power provides stable and uniform treatment, making it ideal for sensitive components and precision surface modification. |
|---|---|
| 2. Accurate Gas Mixing Capability | With standard 2 MFCs (Ar and O₂) and optional expansion to 3 MFCs, the system allows precise gas flow control and flexible process development. |
| 3. Reliable Siemens PLC Control | The integrated Siemens PLC ensures consistent process repeatability, easy recipe storage, and userfriendly operation for both R&D and production environments. |
| 4. Compact Design with EFicient Footprint | The 60-liter chamber size oWers suWicient capacity for small to medium batch processing while maintaining space-saving installation in laboratories or industrial production lines. |
The 60-Liter Vacuum Plasma Treatment System VL-60-A is a compact and versatile solution designed for precision surface cleaning, activation, and modification applications. Powered by a stable 500W plasma generator, it delivers uniform and controlled plasma treatment suitable for delicate and high-value components. The system features a Siemens PLC control platform for reliable operation, intuitive parameter setting, and repeatable process management. Equipped with standard two MFCs (Ar and O₂) and customizable up to three MFCs, it offers flexible gas configuration to meet diverse process requirements.
| Plasma Main Unit | Dimension (L*W*H) | 930*765*1750mm |
| Chamber (L*W*H) (customizable) | 400*400*410mm | |
| Plasma Power Supply | Plasma Power Supply | 13.56MHz / 40kHz (opt.) |
| Power Rating | 500W | |
| Control System | Control Method (PLC) | Siemens – SIMATIC HMI Smart 700 IE V5 |
| Display | 7″ Touch Screen | |
| Vacuum System | Chamber Material | Aluminum Alloy |
| Chamber Leak Rate | > 15Pa/s | |
| Ultimate Vacuum | < 5Pa/s | |
| Process Layers (customizable) | 6 pcs (Wire Mesh) | |
| Venting Time | ≤ 8s | |
| Pump Down Time | ≤ 50s | |
| Vacuum Pump | 60m³/h | |
| Pump Type | Oil-Sealed Pump or Dry Pump (opt.) | |
| Gas System | Process Gas Flow Range | 0-300SCCM |
| Process Gas Lines | Standard (Ar/O₂) with 2 MFCs Optional (N₂/H₂/He) with 3 MFCs | |
| Facility Requirements | Equipment Power Supply | 380V 50Hz, 5-Wire |
| Equipment Gas Source (Air Supply) | ≥ 0.4MPa | |
| Equipment Power | 4.5kW | |
| Operating Environment | 0°C – 50°C |
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