Products & Services

VL-800-A

Additional information

1. High-Volume Industrial Processing

The large 800-liter chamber combined with 6 customizable working trays enables eXicient treatment of bulky components or high-batch quantities, significantly increasing production throughput.

2. Powerful and Stable Plasma Output

With 6kW plasma power, the system delivers strong, uniform plasma density, ensuring deep surface activation and consistent treatment quality even under heavy loading conditions.

3. Optimized Vacuum and Thermal Stability

The 1200 m³/h vacuum pump ensures fast pump-down times and stable vacuum levels, while the 1375 kcal/h chiller maintains eXective cooling for continuous and reliable long-term operation.

4. Flexible and Intelligent Process Control

The Siemens PLC system, together with standard 2 MFCs (Ar and O₂) and optional expansion to 3 MFCs, provides precise gas flow control, repeatable recipes, and seamless integration into automated production environments.

Overview

The 800-Liter Vacuum Plasma Treatment System VL-800-A is a high-capacity industrial solution engineered for large-scale surface cleaning, activation, and coating applications. Powered by a robust 6kW plasma generator, it delivers strong and uniform plasma distribution to ensure consistent treatment results across heavy or high-volume batches. The system is controlled by a reliable Siemens PLC platform for precise parameter management, recipe storage, and seamless automation integration. It comes standard with 2 MFCs (Ar and O₂), expandable to 3 MFCs for advanced gas process flexibility, along with 6 customizable working trays to accommodate various component sizes. Equipped with a 1200 m³/h vacuum pump and a chiller with 1375 kcal/h cooling capacity, the system ensures stable vacuum performance and efficient thermal management during continuous operation.

Specification

Technical Parameters
Plasma Main Unit Pump/ ChillerDimension (L*W*H)1780*1740*1900mm
Chamber (L*W*H) (customizable)890*900*1020mm
Pump (L*W*H)1174*554*910mm
Chiller (L*W*H)1150*600*1250mm
Plasma Power SupplyPlasma Power Supply13.56MHz / 40kHz (opt.)
Power Rating6KW
Control SystemControl Method (PLC)Siemens – SIMATIC HMI Smart 1000 IE V5
Display10″ Touch Screen
Vacuum SystemChamber MaterialAluminum Alloy
Chamber Leak Rate> 10Pa/s
Ultimate Vacuum< 1Pa/s
Process Layers (customizable)6 pcs (Electrode Trays)
Venting Time≤ 40s
Pump Down Time≤ 70s
Vacuum Pump1200m³/h
Pump TypeOil-Sealed Pump or Dry Pump (opt.)
Chiller SystemCooling Capacity1375kcal/h
Supply Temperature20°C – 25°C
Flow Rate3.2m³/h
Gas SystemProcess Gas Flow Range0-3000SCCM
Process Gas LinesStandard (Ar/O₂) with 2 MFCs
Optional (N₂/H₂/He) with 3 MFCs
Facility RequirementsEquipment Power Supply380V 50Hz, 5-Wire
Equipment Gas Source (Air Supply)≥ 0.4MPa
Equipment Power20kW
Operating Environment0°C – 50°C

Applications

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