| 1. Uniform Powder Treatment | The 1.65 L rotating drum ensures continuous mixing during plasma exposure, providing homogeneous surface modification of powders and granular materials. |
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| 2. Gentle and Controlled Plasma Processing | The 300W plasma power delivers stable and precise treatment, making it ideal for sensitive powders without causing thermal damage. |
| 3. Accurate Gas Flow Control | Equipped with standard 2 MFCs (Ar and O₂), the system enables precise gas mixing and repeatable process parameters for consistent surface functionalization. |
| 4. Compact and User-Friendly Operation | The bench-top design combined with a Siemens PLC control system ensures easy operation, reliable performance, and suitability for laboratory research and small-scale production. |
The bench-top powder Vacuum Plasma Treatment System VL-10-F is specifically designed for uniform surface modification of powders and granular materials using a 1.65-liter rotating drum. The integrated drum rotation ensures continuous mixing during processing, enabling homogeneous plasma exposure and consistent treatment results. Powered by a stable 300W plasma generator, the system provides precise and gentle surface activation suitable for sensitive powder applications. Equipped with a Siemens PLC control system and standard 2 MFCs (Ar and O₂), it ensures accurate gas flow regulation, repeatable process control, and reliable laboratory-scale operation.
| Plasma Main Unit | Dimension (L*W*H) | 620*550*680mm |
| Chamber (L*W*H) (customizable) | 200*250*200mm | |
| Rotating Drum (L*Ø) (customizable) | 110*138mm | |
| Weight w/o Pump | 200 kg | |
| Plasma Power Supply | Plasma Power Supply | 13.56MHz |
| Power Rating | 300W | |
| Control System | Control Method (PLC) | Siemens – SIMATIC HMI Smart 700 IE V5 |
| Display | 7″ Touch Screen | |
| Vacuum System | Chamber Material | Stainless Steel |
| Chamber Leak Rate | > 15Pa/s | |
| Ultimate Vacuum | < 5Pa/s | |
| Vacuum Measurement | Pirani Vaccum Gauge | |
| Venting Time | ≤ 15s | |
| Pump Down Time | 20s~40s | |
| Vacuum Pump | 24m³/h | |
| Pump Type | Oil-Sealed Pump or Dry Pump (opt.) | |
| Gas System | Process Gas Flow Range | 0-300SCCM |
| Process Gas Lines | Standard (Ar/O2) with 2 MFCs | |
| Facility Requirements | Equipment Power Supply | AC220 ( ±10%) |
| Equipment Gas Source (Air Supply) | ≥ 0.4MPa | |
| Equipment Power | 1.8kW | |
| Operating Environment | 0°C – 50°C |
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