| 1, High Processing Efficiency | The 1200 W plasma power enables fast, uniform surface activation and cleaning, reducing cycle times while maintaining consistent treatment quality. |
|---|---|
| 2. Precise and Stable Process Control | Integrated with a reliable Siemens PLC system, the equipment ensures accurate parameter control, excellent repeatability, and easy operation. |
| 3. Flexible Gas Configuration | Standard dual MFCs for Argon (Ar) and Oxygen (O₂), with the option to add a third customizable MFC, allow tailored gas mixtures for a wide range of material applications. |
| 4. Adaptable Batch Handling | Equipped with eight standard working trays that can be customized to fit diSerent product sizes and geometries, maximizing chamber utilization and production flexibility. |
The 200 Liter Vacuum Plasma Treatment System VL-200-A is a high-performance solution designed for precise and uniform surface modification of components across various industries. Equipped with a powerful 1200 W plasma generator and a reliable SiemensPLC control system, it ensures stable process control, repeatability, and user-friendly operation. The system comes standard with two mass flow controllers (MFCs) for Argon (Ar) and Oxygen (O₂), with the option to expand to three customizable MFCs for greater process flexibility. Featuring eight standard working trays—also customizable to suit specific product geometries—it offers efficient batch processing within a spacious 200 liter vacuum chamber.
| Technical Parameters | ||
|---|---|---|
| Plasma Main Unit | Dimension (L*W*H) | 1500*1200*2000mm |
| Chamber (L*W*H) (customizable) | 600*600*600mm | |
| Plasma Power Supply | Plasma Power Supply | 13.56MHz |
| Power Rating | 1200W | |
| Control System | Control Method (PLC) | Siemens - SIMATIC HMI Smart 700 IE V5 |
| Display | 7" Touch Screen | |
| Vacuum System | Chamber Material | Aluminum Alloy |
| Chamber Leak Rate | > 15Pa/s | |
| Ultimate Vacuum | < 5Pa/s | |
| Process Layers (customizable) | 8 pcs (Wire Mesh) | |
| Venting Time | ≤ 10s | |
| Pump Down Time | ≤ 150s | |
| Vacuum Pump | 90m³/h | |
| Pump Type | Oil-Sealed Pump or Dry Pump (opt.) | |
| Gas System | Process Gas Flow Range | 0-300SCCM |
| Process Gas Lines | Standard (Ar/O2) with 2 MFCs Optional (N2/H2/He) with 3 MFCs | |
| Facility Requirements | Equipment Power Supply | 380V 50/60Hz, 5-Wire |
| Equipment Gas Source (Air Supply) | ≥ 0.4MPa | |
| Equipment Gas Source (Process Gas) | 0.3 ~ 0.4MPa | |
| Equipment Power | 4.5kW | |
| Operating Environment | 0°C - 50°C | |
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