Products & Services

VL-80-A

Additional information

1. High Process Efficiency

The 1000W plasma power ensures strong, stable plasma generation for fast surface activation, cleaning, and coating, reducing cycle times while maintaining consistent results.

2. Precise Gas Control

Equipped with standard 2 MFCs (Ar and O₂) and optional customization up to 3 MFCs, the system enables accurate gas mixing and process optimization for diverse material requirements.

3. Reliable and Intelligent Control

The Siemens PLC system provides stable operation, precise parameter control, recipe storage, and easy integration into automated production lines.

4. Compact Yet Versatile Chamber Size

The 80-liter vacuum chamber offers an ideal balance between capacity and footprint, making it suitable for R&D, small-batch production, and medium-scale industrial applications.

Overview

The 80-Liter Vacuum Plasma Treatment System VL-80-A is a compact and efficient solution designed for precise surface activation, cleaning, and functional coating processes. Equipped with a powerful 1000W plasma generator, it ensures stable plasma discharge and uniform treatment results across a wide range of materials. The system is controlled by a reliable Siemens PLC for intuitive operation, process stability, and easy parameter management. Standard configuration includes two mass flow controllers (Ar and O₂), with the option to customize up to three MFCs for greater process flexibility and advanced gas mixture applications.

Specification

Technical Parameters
Plasma Main UnitDimension (L*W*H)930*765*1750mm
Chamber (L*W*H) (customizable)515*400*410mm
Plasma Power SupplyPlasma Power Supply13.56MHz / 40kHz (opt.)
Power Rating1000W
Control SystemControl Method (PLC)Siemens – SIMATIC HMI Smart 700 IE V5
Display7″ Touch Screen
Vacuum SystemChamber MaterialAluminum Alloy
Chamber Leak Rate> 15Pa/s
Ultimate Vacuum< 5Pa/s
Process Layers (customizable)6 pcs (Wire Mesh)
Venting Time≤ 10s
Pump Down Time≤ 60s
Vacuum Pump60m³/h
Pump TypeOil-Sealed Pump or Dry Pump (opt.)
Gas SystemProcess Gas Flow Range0-300SCCM
Process Gas LinesStandard (Ar/O₂) with 2 MFCs
Optional (N₂/H₂/He) with 3 MFCs
Facility RequirementsEquipment Power Supply380V 50Hz, 5-Wire
Equipment Gas Source (Air Supply)≥ 0.4MPa
Equipment Power4.5kW
Operating Environment0°C – 50°C

Applications

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